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 Plasma and Coatings Physics

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The Plasma & Coatings Physics group is a division at the Department of Physics, Chemistry and Biology (IFM)Linköping University, Sweden. Our overall goal is to contribute towards addressing challenges of contemporary materials science and technology through the synthesis of novel films and nanomaterials.


Research highlights

High ionization degree of carbon

A strategy that facilitates a substantial increase of carbon ionization in magnetron sputtering discharges is presented. It is based on increasing the electron temperature in a high power impulse magnetron sputtering discharge by using Neon as the sputtering gas.


A large KAW grant to Ulf Helmersson

A consortium lead by Ulf Helmersson is granted SEK 23 004 000 for "Designed Nanoparticles by Pulsed Plasmas" by the Knut and Alice Wallenberg foundation. The funding is for three years 2015-2017.

Highly read & Cited Articles

Highly cited papers

(according to "Essential Science Indicators")

High power impulse magnetron sputtering discharge, J.T. Gudmundsson, N. Brenning, D. Lundin, U. Helmersson, J. Vac. Sci. Technol. 30, 030801 (2012).

Ionized physical vapor deposition (IPVD): A review of technology and applications, U. Helmersson, M. Lattemann, J. Bohlmark, A.P. Ehiasarian, J.T. Gudmundsson, Thin Solid Films 513, 1 (2006).

Mon Sep 05 08:40:00 CEST 2016


Knut och Alice Wallenbergs stiftelse VR






Page manager: ulf.helmersson@liu.se
Last updated: Tue Sep 06 08:35:14 CEST 2016