Plasma and Coatings Physics
The Plasma & Coatings Physics group is a division at the Department of Physics, Chemistry and Biology (IFM), Linköping University, Sweden. Our overall goal is to contribute towards addressing challenges of contemporary materials science and technology through the synthesis of novel films and nanomaterials.
We have developed a new method for fast feed-back control in reactive HiPIMS. By using a constant voltage pulse and measuring the achieved current maximum, the power can be adjusted (through the repetition frequency) that a stoichiometric film is produced.
In a recent paper in APL, we report on the synthesis of copper nanoparticles with a technique developed in the group. The technique is based on a high power pulsed hollow cathode, and has been shown to be able to make nanoparticles with controlled sizes.
A strategy that facilitates a substantial increase of carbon ionization in magnetron sputtering discharges is presented. It is based on increasing the electron temperature in a high power impulse magnetron sputtering discharge by using Neon as the sputtering gas.
A consortium lead by Ulf Helmersson is granted SEK 23 004 000 for "Designed Nanoparticles by Pulsed Plasmas" by the Knut and Alice Wallenberg foundation. The funding is for three years 2015-2017.
Highly read & Cited Articles
Highly cited papers
(according to "Essential Science Indicators")
High power impulse magnetron sputtering discharge, J.T. Gudmundsson, N. Brenning, D. Lundin, U. Helmersson, J. Vac. Sci. Technol. 30, 030801 (2012).
Ionized physical vapor deposition (IPVD): A review of technology and applications, U. Helmersson, M. Lattemann, J. Bohlmark, A.P. Ehiasarian, J.T. Gudmundsson, Thin Solid Films 513, 1 (2006).
Last updated: Tue Sep 06 08:35:14 CEST 2016